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Multiple patterning
Results: 57

#	Item
31	White Paper Accelerating 20nm Double Patterning Verification with IC Validator Author Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:30:50 Design closure Signoff Multiple patterning Physical design Dermatopontin Standard cell DPT vaccine Validator Application-specific integrated circuit Electronic engineering Electronic design automation Design rule checking
32	White Paper Design Solutions for 20nm and Beyond June 2012 Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 12:41:40 Multiple patterning Signoff Design rule checking Standard cell Parasitic extraction Physical design Application-specific integrated circuit Synopsys Integrated circuit design Electronic engineering Electronic design automation Integrated circuits
33	Microsoft PowerPoint - NNINsymposium.feb12 [Compatibility Mode] Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:14:17 Electronics MOSFET CMOS Field-effect transistor Multiple patterning Dynamic voltage scaling International Electron Devices Meeting Electronic engineering Logic families Technology
34	White Paper Accelerating 20nm Double Patterning Verification with IC Validator Author Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 12:41:33 Design closure Signoff Multiple patterning Physical design Dermatopontin Standard cell DPT vaccine Validator Application-specific integrated circuit Electronic engineering Electronic design automation Design rule checking
35	Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:17 Computational lithography Extreme ultraviolet lithography Multiple patterning Photolithography Immersion lithography Optical proximity correction Lithography Resist Electron beam lithography Materials science Technology Microtechnology
36	Lithius AutoCal Demo Report Add to Reading List Source URL: www.eecs.berkeley.edu Language: English - Date: 2009-02-18 17:13:16 Multiple patterning 32 nanometer 22 nanometer
37	We Create Solutions[removed]NW Monroe Ave • Suite 203 • Corvallis, OR 97330 • [removed] Samsung, Intel Capital and Applied Materials Fund Inpria to Develop Advanced Semiconductor Materials Add to Reading List Source URL: www.inpria.com Language: English - Date: 2014-02-18 00:25:01 Extreme ultraviolet lithography Photoresist Applied Materials Semiconductor device fabrication Intel Resist Samsung Immersion lithography Multiple patterning Microtechnology Materials science Technology
38	PROJECT RESULT Lithography T404: Extreme UV lithography masks (EXTUMASK) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:55 Ultraviolet Extreme ultraviolet Mask 45 nanometer Microtechnology Multiple patterning Next-generation lithography Electromagnetic radiation Extreme ultraviolet lithography Photomask
39	PROJECT RESULT Lithography T406: Extreme UV consortium for imaging technology (ExCITe) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:59 Chemistry Multiple patterning Photolithography Extreme ultraviolet Photoresist Ultraviolet 32 nanometer Nanoimprint lithography 45 nanometer Materials science Electromagnetic radiation Extreme ultraviolet lithography
40	Project result CT301 I Extreme UV lithography entry point technology development [EXEPT] The extreme ultra-violet (EUV) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2013-09-04 08:46:13 Extreme ultraviolet lithography Immersion lithography Multiple patterning Extreme ultraviolet Photomask SUSS MicroTec Lithography 32 nanometer Ultraviolet Materials science Electromagnetic radiation Technology

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